PEO-604
MULTIPURPOSE FAST RAMPING FURNACE
Since 1982 ATV is manufacturing the multipurpose fast ramping furnaces PEOs series with a single quartz tube. It was initially developed for thick film paste firing. Since a large variety of new and different processes and applications was and is still being added. ATV applies its PEO PEO-604 series successfully into the semiconductor market segment.
The PEO series PEO-604 is an ideal tool for R&D purposes and pilot line production tool. It can be applied easily for new unique and sophisticated process development as well as low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers up to 200mm.
Next to floor space-saving advantages the PEO-604 also has Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi-process capability when using our easy exchangeable Liners.
To reach the optimal temperature uniformity ATV uses 14 Kanthal heating elements that are positioned around, at the front and on the backside the process tube and are PID controlled.
Facts PEO-604
Technical information and figures
Footprint:
800 x 1.900 x 1.400mm (LxWxH)
Weight: 475 kg
Inner Quartz tube:
230 mm (9”)
Standard Product Temperature:
1.000°C/1.100°C continuously
Flat Zone:
50 wafers / 100 wafers half pitch
Power connection:
3 Phases, 230 VAC, 32 A, 21 kW, 50 Hz, TN-C-S System, others on request
Common Applications PEO-604
CVD, PVD, LPCVD, MOCVD
Si3N4, Poly Si
Insitu doping with toxic gases
Si Epitaxy
TEOS, LTO
Carbon Nanotubes, Si Nanowires, Graphene
Gas/Solid Source Diffusion
Wet/Dry Oxidation
Al Oxidation for VCSEL
Trans LC
SiAl/SiAu/SiMo alloying
Annealing:
- Inert/noble/reactive Atmosphere
- Hydrogen
- High vacuum
Post Implant Annealing
Low K
Polyimide/BCB, Curing/Baking
LTCC Sintering, Thick film paste firing
Features PEO-604
Floor space saving by small footprint
Energy-saving by zero energy consumption at ambient standby
Max 100 wafer/process run
Up to 200mm Ø wafers
Multiple processes by easily exchangeable quartz In Liners
Easily exchangeable quartz In Liners
Temperature Ramping:
- Up to 1.000°C within 15 minutes
- Down to < 100°C in less than 60 minutes
- 1K per 100 minutes (slowest ramping speed up/down)
Max. 1.100°C continuous processing
Temperature range 250°C to 1.100°C
Low temperature processing with gas preheating
Ultimate vacuum < 5 x 10-6 mbar
He leak rate: < 5 x 10-9 mbar l/s
O2 = N2 supply quality
100 steps/program
Options PEO-604
Additional values
Easily exchangeable In Liners for multiple LPCVD/diffusion/ alloying/annealing processes in original process tube
H2 annealing with quartz glass process chamber surrounded by N2 atmosphere
5 heater zone turning for best possible 3 D temperature uniformity
O2/H2O monitoring
Porous SiC ceramics for LTCC sintering
Customized quartz ware
Dry pumps
Heavy-duty doorbell jar carrying 25 kg
DI water bubbler
DI water steamer
H2 torch
Polyimide vapor trap
Turbo pump
LPCVD vacuum pumps