There are many possible processes that may need to be completed on wafers. Some of the potential process steps include:
Thick film conductor paste firing
Pt, Au, AgPd
Ag paste/ink firing
resistor paste
dielectric/glass paste
thick copper conductor paste
dry clean air/N2 atmosphere
Diffusion
Gas source diffusion
Solid source diffusion
Thermal Oxidation/Annealing
Wet/Dry Oxidation
VCSEL
Post implanting annealing
Trans LC
LP CVD
CNT
Graphene, Si3N4
Poly-Si, Epitaxy
Teos, LTO, HTO
Trans LC
PEO-601
MULTIPURPOSE FAST RAMPING FURNACE
Since 1982 ATV is manufacturing the multipurpose tabletop fast ramping furnaces PEOs series with a single quartz tube. It was initially developed for thick film paste firing. Since a large variety of new and different processes and applications was and is still being added. ATV applies its PEO series successfully also in the semiconductor market segment.
The PEO series is an ideal tool for R&D purposes. It can be applied easily for new unique and sophisticated process development as well as low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers up to 100mm.
Next to floor space-saving advantages the PEO also has Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi-process capability when using our easy exchangeable Liners. To reach the optimal temperature uniformity ATV uses 14 Kanthal® heating elements which are positioned around, at the front and on backside the process tube and are PID controlled
PEO-604
MULTIPURPOSE FAST RAMPING FURNACE
Since 1982 ATV is manufacturing the multipurpose fast ramping furnaces PEOs series with a single quartz tube. It was initially developed for thick film paste firing. Since a large variety of new and different processes and applications was and is still being added. ATV applies its PEO 604 series successfully also in the semiconductor market segment.
The PEO 604 series is an ideal tool for R&D purposes and a pilot line production tool. It can be applied easily for new unique and sophisticated process development as well as low to medium volume production applications. This multipurpose furnace has several key aspects integrated and can handle wafers up to 200mm.
Next to floor space-saving advantages the PEO 604 also has Zero energy usage in ambient stand-by. Another unique aspect of the system is the multi-process capability when using our easy exchangeable Liners.
To reach the optimal temperature uniformity ATV uses 14 Kanthal heating elements that are positioned around, at the front and on the backside the process tube and are PID controlled.
